Substrate Preclean, Etch, Deposit and Low
energy assist for Reactive and
Non Reactive processing,
Oxygen, Fluorine, Argon, ...
Filament less, long lifetime
Grid optics for collimated
or focused beam.
Low and high energy:
5 to 200 eV or 200 to 2000 eV.
beam current: 20 to 2000 µA/cm2.
beam diameter: 2 to 20 mm.
Mounting option:
Ion source: Ø 50 mm x 60 mm
internal chamber mounting
flange mounting: 63CF, 100CF
special mounting for UHV (with differential pumping)
Power supply : rack 19" , 3U.
Ion gun IF-35 _______________________________________________________________